RCH Steamer
Hydrogen-Free Wet Oxidation Solution
The effective solution for generating ultra-high purity steam for wet oxidation and steam annealing of silicon and other semiconductor materials.
Only DI H2O is used to produce the steam—No Hydrogen is Required!
Why This Technology Matters
Revolutionary hydrogen-free steam generation that transforms semiconductor wet oxidation processes
The semiconductor industry has traditionally relied on pyrogenic torch systems for wet oxidation processes. These systems generate steam by burning hydrogen and oxygen in a torch, creating the high-purity steam needed for silicon wafer oxidation. However, this approach comes with significant safety risks, operational costs, and maintenance challenges.
RCH Associates' revolutionary RCH Steamer eliminates the need for hydrogen entirely, offering a safer, more cost-effective alternative that delivers ultra-high purity steam without the risks and expenses associated with hydrogen handling.
✓ RCH Steamer
✓ No hydrogen required - eliminates explosion risk
✓ Lower cost of ownership - no gas consumption
✓ Simplified maintenance - no torch components
✓ Improved Process - no torch heat and better uniformity
⚠️ Traditional Pyrogenic Torch
✗ Requires hydrogen gas handling and safety protocols
✗ Ongoing hydrogen gas costs and delivery infrastructure
✗ Torch maintenance and quartzware replacement required
✗ Heat generation affects furnace temperature profiles
Choose Your Model
Three STEAMER models available, configured by maximum steam flow to meet your specific processing requirements
Model 225
Up to 12.5 SLM maximum steam flow
Model 102B-25
Up to 25 SLM maximum steam flow
Model 102B-50
Up to 50 SLM maximum steam flow
Benefits of the RCH Steamer
No Hydrogen: Eliminates the need for H2 to generate hyper-pure steam resulting in safe operation, improved performance and reduced costs. Only DI:H2O is required to generate steam.
No Quartz Breakage: Eliminates torch quartzware, which degrades during the generation of the pyrogenic “flame”. This results in high uptime and reduced maintenance.
Improved Thermal Performance: Improves furnace temperature flat zone profiles by eliminating the heat otherwise produced by pyrogenic torches. This results in improved uniformity and general temperature performance.
Improved Oxide Growth Rates & Uniformity: Establishes high steam flow compared to torches for full tube saturation. This results in improved oxide uniformity and higher oxidation rates.
Critical Dielectric Integrity: Provides the same oxide dielectric integrity as steam generated by pyrogenic torches.
Simple Device Control: Interfaces like a mass-flow controller to gas systems and host controls used by most all diffusion furnace systems. May be used on new installations and retrofits to existing furnace systems
Easy Facility Hookups: Facility requirements are simplified. Only a regulated supply of 16 megaohm DI H2O and a low volume DI H2O drain are required for STEAMER operation.
Warranty & Support
The field-proven STEAMER is fully engineered, manufactured, serviced and warranted by RCH Associates, Inc. For specific information on the STEAMER as it applies to your processing and equipment requirements for production, pilot-line or research applications, please contact RCH Associates.